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Stencil Nano Lithography Based on a Nanoscale Polymer Shadow Mask: Towards Organic Nanoelectronics

机译:基于纳米级聚合物阴影掩模的模板纳米光刻:走向有机纳米电子学

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摘要

A stencil lithography technique has been developed to fabricate organic-material-based electronic devices with sub-micron resolution. Suspended polymethylmethacrylate (PMMA) membranes were used as shadow masks for defining organic channels and top electrodes. Arrays of pentacene field effect transistors (FETs) with various channel lengths from 50μm down to 500nm were successfully produced from the same batch using this technique. Electrical transport measurements showed that the electrical contacts of all devices were stable and the normalized contact resistances were much lower than previously studied organic FETs. Scaling effects, originating from the bulk space charge current, were investigated by analyzing the channel-length-dependent mobility and hysteresis behaviors. This novel lithography method provides a reliable means for studying the fundamental transport properties of organic materials at the nanoscale as well as enabling potential applications requiring the fabrication of integrated organic nanoelectronic devices.
机译:已经开发出模板光刻技术来制造具有亚微米分辨率的基于有机材料的电子设备。悬浮的聚甲基丙烯酸甲酯(PMMA)膜用作荫罩,用于定义有机通道和顶部电极。使用该技术从同一批次成功生产出了从50μm到500nm的各种沟道长度的并五苯场效应晶体管(FET)阵列。电传输测量表明,所有器件的电接触都是稳定的,并且归一化的接触电阻比以前研究的有机FET低得多。通过分析与沟道长度有关的迁移率和磁滞行为,研究了源自体积电荷电流的缩放效应。这种新颖的光刻方法为研究有机材料在纳米尺度上的基本传输性能以及实现可能需要集成有机纳米电子器件制造的潜在应用提供了可靠的手段。

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